This paper introduces a novel T-beam actuator fabricated by a piezoelectric MEMS fabrication process. ICP-RIE etching from the front and back of a bulk PZT chip is used to produce stair stepped structures through the thickness with complex inplane shapes. Masked electrode deposition creates active and passive regions in the PZT structure. With a T-shaped crosssection, and bottom and top flange and web electrodes, a cantilevered beam can bend in-plane and out-of-plane with bimorph actuation in both directions. One of these T-beam actuators is fabricated and experimentally tested. An experimentally validated model predicts that the cross-section geometry can be optimized to produce higher displacement and blocking force.
- Design Engineering Division and Computers in Engineering Division
Piezoelectric T-Beam Microactuators
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Kommepalli, HKR, Hirsh, AD, Rahn, CD, & Tadigadapa, SA. "Piezoelectric T-Beam Microactuators." Proceedings of the ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. Volume 4: 20th International Conference on Design Theory and Methodology; Second International Conference on Micro- and Nanosystems. Brooklyn, New York, USA. August 3–6, 2008. pp. 909-914. ASME. https://doi.org/10.1115/DETC2008-49886
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