A metal sacrificial method has been investigated for creation of microchannels by galvanic corrosion in a metal multilayer. To achieve the fastest sacrificial metal combination, different metals and the corresponding etchants are chosen. Channels from 50 μm to 1 μm wide, 0.2 μm high, and 1500 μm long, as well as the channel array is fabricated, using Cr/Cu galvanic metal couple as sacrificial material. The relationship between the etching front vs. the etching time, and the relationship of the etch rate vs. channel width is measured and compared with the etching performance of the single metal. The measurement shows there is approximately 10 times faster etching in the galvanic coupled metals than that in the single metal. SEM images of the channels and channel array made by this method are presented. This method is compatible with the conventional VLSI process, and has the potential for fabricating microchannels with submicron or even nanometer cross section.
A Sacrificial Method for Fabricating Microchannel Accelerated by Galvanic Corrosion
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Zeng, H, Feinerman, A, & Wan, Z. "A Sacrificial Method for Fabricating Microchannel Accelerated by Galvanic Corrosion." Proceedings of the ASME 2005 International Mechanical Engineering Congress and Exposition. Fluids Engineering. Orlando, Florida, USA. November 5–11, 2005. pp. 305-309. ASME. https://doi.org/10.1115/IMECE2005-81124
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