We apply an elastic field to the substrate to guide the self-assembly of domain patterns on its surface. The effect of arbitrary three dimensional external loading is found to be characterized by a single two dimensional parameter—a surface stain field of the substrate. A non-uniform strain field significantly influences the size, shape and orientation of self-assembled features, and may induce the formation of pattern colonies. It is shown that a pattern orientates normal to the strain gradient direction. An applied load anchors the position of a self-assembled pattern relative to the substrate, where a colony boundary resides on the strain gradient region. The work suggests a method of strain field design to make various monolayer patterns for nanofabrication.
- Nanotechnology Institute
Guided Self-Assembly via Designed Strain Field
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Lu, W. "Guided Self-Assembly via Designed Strain Field." Proceedings of the 2007 First International Conference on Integration and Commercialization of Micro and Nanosystems. First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B. Sanya, Hainan, China. January 10–13, 2007. pp. 729-733. ASME. https://doi.org/10.1115/MNC2007-21614
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