Vapor phase lubrication (VPL) integrates media lubrication with the vacuum processing steps used throughout most of the hard disk media fabrication process. This avoids exposure of the unlubricated a-CHx overcoat surface to the ambient air and airborne contamination. In vapor lubrication the a-CHx surface can be oxidized under controlled conditions immediately prior to lubricant adsorption. The kinetics of a-CHx oxidation have been studied using x-ray photoemission spectroscopy in an apparatus that allows oxidation of freshly deposited a-CHx films. The dissociative sticking coefficient of oxygen is ∼10−6 and the initial oxidation kinetics can be described by a Langmuir-Hinshelwood mechanism.
Issues in Vapor Phase Lubrication of Magnetic Data Storage Media
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Gellman, AJ, & Yun, Y. "Issues in Vapor Phase Lubrication of Magnetic Data Storage Media." Proceedings of the World Tribology Congress III. World Tribology Congress III, Volume 1. Washington, D.C., USA. September 12–16, 2005. pp. 681-682. ASME. https://doi.org/10.1115/WTC2005-63165
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