Linear thermoelastic lamination theory was used to determine the state of residual stresses and warpage in multilayer structures following elevated temperature curing. The inputs necessary are the mechanical and thermal properties of each layer, the stacking sequence of layers, and the irreversible chemical deformation taking place during curing of the polymeric matrix layers. The predictions were verified experimentally with a woven-glass/epoxy material. The basic mechanical and thermal properties and polymerization shrinkage were determined for the unidirectional layer. Subsequently, the warpage was measured for a [06/906] antisymmetric cross-ply laminate by means of the shadow moire´ method. Experimental results were in good agreement with the theoretical prediction.
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March 1990
Research Papers
Thermomechanical Behavior of Multilayer Structures in Microelectronics
I. M. Daniel,
I. M. Daniel
Northwestern University, Evanston, IL 60208
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T.-M. Wang,
T.-M. Wang
Northwestern University, Evanston, IL 60208
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J. T. Gotro
J. T. Gotro
IBM Corporation, Endicott, NY 13760
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I. M. Daniel
Northwestern University, Evanston, IL 60208
T.-M. Wang
Northwestern University, Evanston, IL 60208
J. T. Gotro
IBM Corporation, Endicott, NY 13760
J. Electron. Packag. Mar 1990, 112(1): 11-15 (5 pages)
Published Online: March 1, 1990
Article history
Received:
January 16, 1990
Online:
April 28, 2008
Citation
Daniel, I. M., Wang, T., and Gotro, J. T. (March 1, 1990). "Thermomechanical Behavior of Multilayer Structures in Microelectronics." ASME. J. Electron. Packag. March 1990; 112(1): 11–15. https://doi.org/10.1115/1.2904332
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